http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100367455-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G09B19-0069 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82B3-00 |
| filingDate | 2000-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2003-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2003-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100367455-B1 |
| titleOfInvention | Vacuum multi-chamber plasma CVD system for synthesizing carbon nanotubes and method for synthesizing carbon nanotubes using the system |
| abstract | Substrate loading means for introducing a substrate into the apparatus according to the invention, one low vacuum chamber, two or more high vacuum chambers using different processing processes and different processing gases in each chamber, the substrate being introduced into the chamber in the loading means. And a robot arm for moving the substrate between the chambers and discharging the substrate to and from the chamber, and a substrate collection means for collecting the substrate from outside the apparatus, wherein the elements are disposed in succession. A plasma chemical vapor deposition apparatus and a method for synthesizing carbon nanotubes using the apparatus are provided. |
| priorityDate | 2000-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.