| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e68936d3fb435785c9dcd044cfe3b5d4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S156-916 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
1996-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2000-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8eb47849290fe7e03ac17b24be478f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0884cd9f272cb80224fec9525651ef33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b83fc24421389672c5db07cd7b80d2b9 |
| publicationDate |
2000-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100244955-B1 |
| titleOfInvention |
Electrode unit for cleaning of thermal CVD apparatus |
| abstract |
The electrode unit of the thermal CVD apparatus is used to generate the cleaning discharge in the field cleaning process. The electrode unit includes a substrate support and a shield member connected to the high frequency power supply mechanism, and an auxiliary electrode disposed in the gas supply section, which is provided with an earthed gas supply section. In the thermal CVD apparatus, the reaction gas is supplied from the gas supply unit during the film formation step, and an excited state of the reaction gas is generated in the front space of the substrate to form a thin film on the substrate surface. The field cleaning process is carried out regularly. In the cleaning step, the cleaning gas is supplied from the gas supply unit to generate a cleaning discharge to remove the film attached to the exposed surface of the substrate support and the shield member. The auxiliary electrode concentrates the cleaning discharge in the space around the adhesion film. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100909947-B1 |
| priorityDate |
1995-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |