| abstract |
The present invention provides an alkoxy-styrene polymer of the following general formula (I) containing an acetal group, a method for producing the same, and a highly sensitive, high resolution chemically amplified negative resist material containing the same as a main component.n n n n n n n n Wherein R 1 and R 3 are —H or —CH 3 , and R 2 is , or R 4 , R 5 , R 6 , R 7 and R 8 are —H, an alkyl group, or an aryl group, each of which is independent. m + n = 1, an integer of k = 1-5, and an integer of 1 = 0-5.n n n The resist prepared in the present invention not only has excellent transparency to short-ultraviolet rays, but also has high sensitivity, high resolution and high resolution on dry etching, and alkali development. |