http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2020059604-A1
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02 |
filingDate | 2019-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2021-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-WO2020059604-A1 |
titleOfInvention | Imprint laminate, imprint laminate manufacturing method, pattern formation method and kit |
abstract | A laminate for imprint that can provide excellent adhesion to a substrate or the like of a cured product formed from the photocurable composition for imprint and also provide excellent wettability of the photocurable composition for imprint. In order to obtain the above, an imprint laminate is provided on the surface of the lower layer film 11 formed from the composition for forming the lower layer film containing a polymer having a radically polymerizable group and a cationically polymerizable group, and the surface of the lower layer film 11. A photocurable composition for imprint containing a liquid film 12 containing a radically polymerizable compound that is liquid at 23 ° C. and 1 atm, and a radically polymerizable compound and a photoradical polymerization initiator provided on the surface of the liquid film 12. 13 and was configured to have. |
priorityDate | 2018-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 137.