http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018168258-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-18 |
| filingDate | 2018-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2018168258-A1 |
| titleOfInvention | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and electronic device manufacturing method |
| abstract | Actinic ray-sensitive or radiation-sensitive resin composition capable of providing a pattern with excellent resolution, resist film using the above-mentioned actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and production of electronic device Provide a method. The actinic ray-sensitive or radiation-sensitive resin composition is used for forming a pattern having a film thickness of 1 μm or more, and contains a resin and the content of impurities having an absorption at a wavelength of 248 nm is 1. It is not more than 00% by mass. |
| priorityDate | 2017-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 178.