http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018163602-A1
Outgoing Links
Predicate | Object |
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classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2022 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
filingDate | 2018-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2019-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-WO2018163602-A1 |
titleOfInvention | Method for producing plated object, and photosensitive resin composition for producing plated object |
abstract | [Problem] A method of manufacturing a plated object capable of suppressing plating infiltration during a plating process, and forming a resist, which is used in the method of manufacturing a plated object, in which plating infiltration is suppressed, on a substrate. Provided is a photosensitive resin composition for producing a plated molded article that can be formed. A method of manufacturing a plated molded article according to the present invention comprises: a resin (A) having increased solubility in alkali due to the action of an acid on a substrate; a photoacid generator (B); A step (1) of forming a photosensitive resin coating film of a photosensitive resin composition containing a compound (C) which decomposes to generate a primary or secondary amine, and a step of exposing the photosensitive resin coating film (2) ), A step (3) of developing a photosensitive resin coating film after exposure to form a resist pattern, and a step (4) of performing plating using the resist pattern as a mask. [Selection diagram] Fig. 1 |
priorityDate | 2017-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 263.