http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018142888-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D36-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D15-361 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D29-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-3092 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B9-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B9-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate | 2018-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2018142888-A1 |
| titleOfInvention | Chemical solution manufacturing method and chemical solution manufacturing apparatus |
| abstract | An object of the present invention is to provide a method for producing a chemical solution capable of producing a chemical solution having excellent defect suppression performance. The method for producing a chemical solution according to the present invention is a method for producing a chemical solution containing an organic solvent using a production device, comprising the steps of: cleaning the production device using a cleaning liquid; And after performing the steps A and B, the steps A and B are repeatedly performed until the cleaning liquid taken out of the manufacturing apparatus satisfies the following condition 1. And a preparation step of preparing a drug solution in the manufacturing apparatus. Condition 1: A cleaning liquid is applied on a substrate, and a change in density of particles having a particle diameter of 20 nm or less on the substrate before and after the application of the cleaning liquid is 0.5 particles / cm 2 or less. |
| priorityDate | 2017-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.