| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-145
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-147
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate |
2013-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c2268ab6d52a86dc03af3f369668589
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d15835feeb1a7bd77386e5fa4161cf2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4856861c3aa0e9c958f966e2283bfc54 |
| publicationDate |
2015-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2015049395-A |
| titleOfInvention |
Method for producing resist composition |
| abstract |
An object of the present invention is to provide a method for producing a resist composition capable of producing a resist composition with reduced coating defects. A method of manufacturing a resist composition used in a semiconductor device manufacturing process, wherein the resist composition manufacturing apparatus is cleaned with a cleaning liquid, and the cleaning liquid is taken out of the manufacturing apparatus and spin-coated on an evaluation substrate. A resist composition for producing the resist composition with the production apparatus after washing until a change in defect density of defects having a size of 100 nm or more before and after coating on the evaluation substrate is 0.2 pieces / cm 2 or less. Manufacturing method. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200092390-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102185208-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200091920-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018128159-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021106537-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200078614-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190089022-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015072418-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018128159-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018142888-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018142888-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I763770-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11392046-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20230128393-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20230026538-A |
| priorityDate |
2013-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |