http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018047220-A1
Outgoing Links
Predicate | Object |
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classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1274 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-352 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0622 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-268 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1285 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-268 |
filingDate | 2016-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2019-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-WO2018047220-A1 |
titleOfInvention | Laser apparatus and laser annealing apparatus |
abstract | A laser apparatus for laser annealing comprises the following: A laser oscillator that outputs pulsed laser light; An OPS apparatus including at least one OPS disposed on the optical path of pulsed laser light output from a laser oscillator and stretching the pulse time width of the incident pulsed laser light, wherein the length of the delay optical path among the OPSs An OPS device in which the delay optical path length L (1) of the first OPS for which the delay optical path length L is minimized is within the range of the following formula (A). ΔT 75% × c ≦ L (1) ≦ ΔT 25% × c (A) Here, ΔT a% is the full time width of the position where the light intensity shows a value of a% with respect to the peak value in the input waveform of the pulse laser light output from the laser oscillator and incident on the OPS device, c is the speed of light. |
priorityDate | 2016-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.