http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018047220-A1

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-352
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0622
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-268
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-268
filingDate 2016-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2019-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2018047220-A1
titleOfInvention Laser apparatus and laser annealing apparatus
abstract A laser apparatus for laser annealing comprises the following: A laser oscillator that outputs pulsed laser light; An OPS apparatus including at least one OPS disposed on the optical path of pulsed laser light output from a laser oscillator and stretching the pulse time width of the incident pulsed laser light, wherein the length of the delay optical path among the OPSs An OPS device in which the delay optical path length L (1) of the first OPS for which the delay optical path length L is minimized is within the range of the following formula (A). ΔT 75% × c ≦ L (1) ≦ ΔT 25% × c (A) Here, ΔT a% is the full time width of the position where the light intensity shows a value of a% with respect to the peak value in the input waveform of the pulse laser light output from the laser oscillator and incident on the OPS device, c is the speed of light.
priorityDate 2016-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 21.