http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017208667-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1454 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate | 2017-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2017208667-A1 |
| titleOfInvention | Polishing liquid and chemical mechanical polishing method |
| abstract | An object of the present invention is to provide a polishing solution in which abrasive grains contained in a polishing solution are not easily aggregated and defects are not easily generated on a surface to be polished even when applied to CMP. Another object is to provide a chemical mechanical polishing method. The polishing solution of the present invention is a polishing solution for chemical mechanical polishing comprising abrasive grains, an organic acid and alcohol A, wherein alcohol A is selected from methanol, ethanol, 1-propanol and isopropanol. The content of alcohol A is 1.0 to 800 mass ppm in the total mass of the polishing liquid. |
| priorityDate | 2016-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 192.