| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate |
2003-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2005-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2005519479-A |
| titleOfInvention |
Methanol-containing silica-based CMP composition |
| abstract |
The present invention provides a polishing composition comprising (a) a silica abrasive, (b) methanol, and (c) a liquid carrier, the polishing composition having a pH of 1-6. And the polishing composition is colloidally stable. The present invention also provides a method for polishing a substrate comprising a silicon-based dielectric layer using the polishing composition. The present invention further provides a method for stabilizing a silica abrasive in a polishing composition by contacting the abrasive with methanol. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I798176-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009532855-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017208667-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017208667-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014103725-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014103725-A1 |
| priorityDate |
2002-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |