http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017170249-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L65-00 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-14 |
| filingDate | 2017-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2017170249-A1 |
| titleOfInvention | Photosensitive resin composition |
| abstract | Disclosed is a photosensitive resin composition which is excellent in chemical resistance and electrical insulation, and which can provide a cured relief pattern having a cross-sectional shape with a normal taper after curing. The present invention comprises an alkali-soluble resin (A) comprising polyimide and a precursor thereof, and one or more selected from polybenzoxazole and a precursor thereof, and a (meth) acrylic group-containing compound (B), The meta) acrylic group-containing compound (B) is selected from the structure represented by the general formula (1), and the general formula (2-1), the general formula (2-2), and the general formula (2-3) A condensate of a compound having one or more types of structures, which comprises a polyfunctional (meth) acrylic group-containing silane condensate (B1) having a plurality of structures of the general formula (1); The photosensitive resin composition whose weight average molecular weight is 1,000-20,000. In the general formula (1), R 1 represents a hydrogen atom or a methyl group, m represents an integer within the range of 1 ≦ m ≦ 4, and the asterisk indicates a bonding site. 1) In (2-2) and (2-3), R 2 represents a methyl group or an ethyl group, n represents an integer within the range of 1 ≦ n ≦ 4. |
| priorityDate | 2016-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 509.