| abstract |
(A) By an actinic ray-sensitive or radiation-sensitive composition containing two or more structures represented by the following general formula (1), a compound having no acid crosslinkable group, and (B) a resin In particular, in the formation of ultrafine patterns (for example, a line width of 50 nm or less), it is possible to form a pattern excellent in sensitivity, resolution, roughness performance, and pattern cross-sectional shape. Composition, and a resist film, a pattern formation method, and an electronic device manufacturing method using the same. [Chemical 1] In the formula, X represents an oxygen atom or a sulfur atom, and R represents a hydrogen atom or a monovalent organic group. * Represents a bond. |