http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001022067-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f09378c018e7719f171f7e91f2dd60fd |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1999-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d23ebe2ff7fd4339040395a910f954c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e266f4cb3b8de826114f79c58113b74 |
| publicationDate | 2001-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001022067-A |
| titleOfInvention | Positive-type ultraviolet photosensitive resin composition and method for forming resist pattern using the same |
| abstract | (57) [Problem] To provide a positive ultraviolet photosensitive resin composition useful for a resist material. SOLUTION: A (co) polymer of a p-hydroxy-α-methylstyrene compound and, if necessary, another unsaturated monomer copolymerizable with the compound, a carboxyl group-containing resin, and an ether bond-containing olefinically unsaturated. A positive-type ultraviolet-sensitive resin composition comprising a compound and a photoacid generator. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017056832-A1 |
| priorityDate | 1999-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 344.