http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015111731-A1
Outgoing Links
Predicate | Object |
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classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-0289 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1884 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-119 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-0108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13439 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-125 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-00 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D5-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B13-00 |
filingDate | 2015-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2017-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-WO2015111731-A1 |
titleOfInvention | Pattern forming method, substrate with transparent conductive film, device and electronic apparatus |
abstract | Provided is a pattern forming method capable of stably forming a pattern including a fine line by suppressing a bulge generated when forming a line-shaped liquid, and achieving both high transparency and low visibility. In the pattern forming method, a liquid containing a functional material is ejected by a liquid droplet ejection device (H), and the sequentially ejected liquid droplets are united on a base material (1) to thereby form a linear liquid containing the functional material. (2) and a step of selectively depositing a functional material on an edge of the line-shaped liquid (2) by evaporating and drying the line-shaped liquid (2). The droplet application amount of the line liquid is controlled to be 4.5 × 10 −10 to 5.5 × 10 −9 [m 3 / m], and the contact angle of the droplet on the substrate (1) is It is controlled to be 10 to 45 [°], the diameter of a single landing droplet on the substrate (1) of the droplet is D [m], and the discharge interval of the droplet on the substrate 1 is p [m. ], The relationship with the discharge frequency f [1 / s] satisfies the following expression. |
priorityDate | 2014-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.