| abstract |
The present invention provides a liquid composition used for etching a multilayer film containing copper and molybdenum, an etching method for etching a multilayer film containing copper and molybdenum, and a substrate. In the present invention, (A) maleate ion source, (B) copper ion source, and (C) 1-amino-2-propanol, 2- (methylamino) ethanol, 2- (ethylamino) ethanol, 2 -(Butylamino) ethanol, 2- (dimethylamino) ethanol, 2- (diethylamino) ethanol, 2-methoxyethylamine, 3-methoxypropylamine, 3-amino-1-propanol, 2-amino-2-methyl-1 An amine compound that is at least one selected from the group consisting of -propanol, 1-dimethylamino-2-propanol, 2- (2-aminoethoxy) ethanol, morpholine, and 4- (2-hydroxyethyl) morpholine; A liquid composition having a pH value of 4 to 9 is used. |