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filingDate 2013-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2016-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2013176168-A1
titleOfInvention Parts for plasma processing apparatus and method for manufacturing parts for plasma processing apparatus
abstract A component for a plasma processing apparatus, comprising: a base material; a base layer that covers the surface of the base material; and an yttrium oxide coating that covers the surface of the base layer, wherein the base layer has a thermal conductivity of 35 W / The yttrium oxide film is composed of a metal oxide film of m · K or less, and the yttrium oxide film includes at least a particulate part made of yttrium oxide in which a grain boundary is observed and a non-particulate part made of yttrium oxide in which the grain boundary is not observed. The yttrium oxide film has a film thickness of 10 μm or more, a film density of 96% or more, and an area ratio of the particulate portion in the observation range of 20 μm × 20 μm on the surface of the yttrium oxide film. 0 to 20%, and the area ratio of the non-particulate portion in the observation range is 80 to 100%.
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