http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2013172435-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L63-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L101-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-68 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2013-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2013172435-A1 |
| titleOfInvention | Alkali development type thermosetting resin composition, printed wiring board |
| abstract | An alkali development type thermosetting resin composition capable of forming a pattern by development and a printed wiring board are provided. Alkali developable resin, A thermoreactive compound, and A photobase generator, An alkali-developable thermosetting resin composition characterized in that a negative-type pattern can be formed by alkali development by an addition reaction between the alkali-developable resin and the heat-reactive compound by selective light irradiation. It is a thing. |
| priorityDate | 2012-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 522.