http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2013024756-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2012-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2013024756-A1 |
| titleOfInvention | Photoresist composition |
| abstract | An object of the present invention is to provide a photoresist composition that sufficiently satisfies basic characteristics such as sensitivity and is excellent in MEEF, DOF, and LWR. The present invention provides a [A] polymer having an acid-generating group, and an acid generator having at least one structure selected from the group consisting of a [B] lactone structure, a cyclic carbonate structure, a sultone structure, and an alicyclic structure. It is a photoresist composition to contain. [B] The acid generator preferably has at least one structure selected from the group consisting of a lactone structure and a sultone structure. Furthermore, the [A] polymer is at least one structure selected from the group consisting of the structural unit (I) represented by the following formula (1) and the structural unit (II) represented by the following formula (2). It is good to include the unit. |
| priorityDate | 2011-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 525.