| abstract |
It contains a base component (A) and an acid generator component (B), and the base component (A) is a structural unit derived from an acrylate ester containing a lactone-containing cyclic group, an ether-containing cyclic group At least one structural unit (a2) selected from the group consisting of a structural unit derived from an acrylate ester containing, and a structural unit derived from an acrylate ester containing a carbonate-containing cyclic group, and an acid dissociable group A resin component (A1) having a structural unit (a1) derived from an acrylate ester containing, wherein the acid generator component (B) is represented by either the following general formula (b1) or (b2): A negative developing resist composition for forming a guide pattern, comprising an acid generator (B1) comprising at least one kind of compound. [Chemical 1] |