http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2008001679-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-18 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 2007-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2008001679-A1 |
| titleOfInvention | Pattern forming method and organic thin film forming composition used therefor |
| abstract | (1) On the substrate, (C) a radiation-sensitive acid generator that generates an acid upon irradiation with radiation or (D) a lower layer film containing a radiation-sensitive base generator that generates a base upon irradiation with radiation is formed. And (2) irradiating the lower layer film with radiation through a mask having a predetermined pattern to expose the lower layer film, and forming an exposed lower layer film portion selectively exposed in a predetermined pattern; (3) (E) forming an organic thin film on the lower layer film, and chemically bonding the exposed lower layer film part and the organic thin film formed on the exposed lower layer film part; And a step of removing an organic thin film formed on a portion other than the exposed underlayer film portion. |
| priorityDate | 2006-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 1017.