http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2007004381-A1
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-452 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42 |
filingDate | 2006-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2009-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-WO2007004381-A1 |
titleOfInvention | Method for manufacturing SiOCH film, plasma CVD apparatus, and SiOCH film |
abstract | A method for producing a SiOCH film includes a step of generating plasma with a plasma source, a step of supplying TEOS gas to a film forming chamber in which a substrate is held, a step of introducing plasma from the plasma source into the film forming chamber, A step of decomposing TEOS by contacting with TEOS and depositing a SiOCH film on the substrate; The manufacturing apparatus includes a plasma source that generates plasma, a film forming chamber having a substrate holder on which a substrate is placed, and a connection portion that connects the plasma chamber and the film forming chamber, from the plasma source through the connection portion. The TEOS supplied to the film forming chamber is decomposed by the plasma introduced into the film forming chamber, and is deposited as a SiOCH film on the substrate. |
priorityDate | 2005-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.