http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2007004381-A1

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-452
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42
filingDate 2006-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2009-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2007004381-A1
titleOfInvention Method for manufacturing SiOCH film, plasma CVD apparatus, and SiOCH film
abstract A method for producing a SiOCH film includes a step of generating plasma with a plasma source, a step of supplying TEOS gas to a film forming chamber in which a substrate is held, a step of introducing plasma from the plasma source into the film forming chamber, A step of decomposing TEOS by contacting with TEOS and depositing a SiOCH film on the substrate; The manufacturing apparatus includes a plasma source that generates plasma, a film forming chamber having a substrate holder on which a substrate is placed, and a connection portion that connects the plasma chamber and the film forming chamber, from the plasma source through the connection portion. The TEOS supplied to the film forming chamber is decomposed by the plasma introduced into the film forming chamber, and is deposited as a SiOCH film on the substrate.
priorityDate 2005-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6517
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http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426099013
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419555680

Total number of triples: 21.