| abstract |
There is no problem in combustibility and human accumulation, the acidity and boiling point of the acid generated is high, the acid diffusion length in the resist film is moderately short, the dependence on the mask pattern sparse density is small, and smoothness A novel acid generator capable of forming an excellent resist pattern, a sulfonic acid generated from the acid generator, a sulfonyl halide compound useful as a raw material for synthesizing the acid generator, and a sensitivity containing the acid generator A radiation resin composition is provided. The acid generator has a structure represented by the following general formula (I). [However, R 1 represents a monovalent substituent such as an alkoxycarbonyl group, an alkylsulfonyl group, or an alkoxysulfonyl group, R 2 to R 4 represent a hydrogen atom or an alkyl group, k represents an integer of 0 or more, and n represents It is an integer of 0-5. ] In addition to the acid generator, the radiation-sensitive resin composition contains an acid-dissociable group-containing resin in the positive type and an alkali-soluble resin and a crosslinking agent in the negative type. |