| abstract |
(57) [Problem] To provide a chemically amplified positive photoresist composition which is substantially free from standing waves and development defects, and which has high sensitivity and high resolution. (A) a compound having an acetal group having a specific terminal structure and decomposing by the action of an acid to increase the solubility in an alkali developing solution; and (b) an acid by irradiation with actinic rays or radiation. Positive photoresist composition containing a compound that generates phenomena. |