| abstract |
PURPOSE:To obtain a photosensitive composition having high photo-sensitivity and improved lithographic characteristics and suitable for interlayer insulation film for semiconductor element, etc., by compounding a polymer having a specific structure, an oxime compound and a sensitizer having a specific absorption peak wavelength. CONSTITUTION:The objective composition can be produced by compounding (A) a polymer having a recurring unit of formula I [x is (2+n)-valent carbon cycle group or heterocyclic group; Y is (2+m)-valent carbon cycle group or heterocyclic group; Z is group of formula II, III, etc.; R* is group having C-C double bond; W is group capable of forming a ring by reacting with COOR* by heat-treatment, n is 1-2; m is 0-2] with (B) 0.1-20(wt)%, preferably 1-15% (based on the component A) oxime compound of formula IV (R1 is H, 1-6C alkyl, NO2, etc.; R2 is 1-6C alkyl, 1-6C alkoxy, etc.; R3 is R2 or aromatic hydrocarbon group) and (C) 0.01-20%, preferably 0.05-15% (based on the component A) sensitizer having an absorption peak wavelength of 250-500nm (e.g. Michler's ketone). |