| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d9705e72caa2c6990430c3e4cf53c25e |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2008-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf6758551ca0a4fd19d6c20d4642cb14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6700b2e336b0b1e0671a857fd32d388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_665d3bd3a2dd9fcb894cc23bcee8ab17 |
| publicationDate |
2010-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2010091753-A |
| titleOfInvention |
Polymerizable composition, negative resist using the same, and image pattern forming method using the same |
| abstract |
A highly sensitive polymerizable composition that efficiently generates active radicals upon irradiation with energy rays is provided. Furthermore, it provides a negative resist material suitable for use in photoresist materials that has a very high curing speed and is suitable for very clear pattern exposure or direct writing, and has excellent adhesion to the substrate. To do. A polymerizable composition comprising a specific oxime ester radical polymerization initiator (A), a radical polymerizable compound (B), and an alkali-soluble resin. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112300026-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022075673-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017078049-A |
| priorityDate |
2008-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |