http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S62240954-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_60e21de07fa18fc54e2150daffc14654 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1986-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b826d1f4e68b694e2187d58559b75c7a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5335037ecf78862f31b5bff5fe3c44aa |
| publicationDate | 1987-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S62240954-A |
| titleOfInvention | Resist material |
| abstract | PURPOSE:To enhance sensitivity and to improve resistance to plasma treatment by incorporating a specified siloxane polymer and a polymer containing specified repeating units. CONSTITUTION:The siloxane polymer is represented by formula I in which each of R1-R3 is H, alkyl, or the like; each of l-n is 0 or a positive integer, and both are not simultaneously 0; X is R-(C=O)- or R-(CHOH)-; and R is an optionally substituted hydrocarbon. The polymer of formula I is obtained by subjecting a cyclic phenylsiloxane, such as hexaphenyl-cyclotrisiloxane, with alkali metal hydroxide or alkali metal alkoxide to ring-opening polymerization, and modifying the obtained polydiphenylsiloxane. The second polymer contains the repeating units each represented by formula II in which R4 is H, alkyl, or phenyl; Y is alkyl or alkylsilyl; Z is -(RO2)- or -O-(CO)-O-; and p is O or a positive integer. The resist material comprises these two kinds of polymers, thus permitting a pattern high in aspect ratio and resistance to dry etching using CF4 or the like to be obtained with high sensitivity. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S63231331-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0429149-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S63239440-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6391654-A |
| priorityDate | 1986-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.