http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S62147732-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 1985-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37a94d11dfe879c6e6e44036a92c9fc9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbb1a5ffe26673d72c17baeae34e843c |
| publicationDate | 1987-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S62147732-A |
| titleOfInvention | Dry etching method |
| abstract | PURPOSE: To enhance the accuracy and selection ratio of a fine pattern and to eliminate a damage on a substrate by plasma etching and particularly reac tive ion etching most thicknesswise direction by discharge exciting, and then photovoltaic dry etching the remaining thickness of a fine film in the thick nesswise direction. n CONSTITUTION: Reactive ion etching is executed by supplying 10mλ/min of CCl 4 and 5ml/min of He as reaction gases, applying 200W of high frequency power of 13.56MHz and plasma discharging, the discharge is stopped after etching approx. 450nm, and photovoltaic vapor-phase reactive etching is then performed. 135ml/min of Hc and 1ml/min of O 2 are supplied into a reaction vessel 20, and ultraviolet ray is emitted from a mercury-xenon lamp 26 at 100Torr of pressure to remove by etching all remaining Al-Si alloy film 33. Thus, a fine pattern can be enhanced in accuracy and selection ratio, and a damage on a substrate is eliminated. n COPYRIGHT: (C)1987,JPO&Japio |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6309972-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1006568-A1 |
| priorityDate | 1985-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5943 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527288 |
Total number of triples: 17.