http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6155643-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20d3042eb4ea7c9afd525aa89373349d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0384 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-00 |
| filingDate | 1984-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d38aa7026b65e8dffa17a86c81f98f0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f7558493d510b24ef442b1c5a029cf5 |
| publicationDate | 1986-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S6155643-A |
| titleOfInvention | Photosensitive image forming material developable from aqueous alkaline developer |
| abstract | PURPOSE:To enable a development with a high photosensitivity from an aqueous alkaline developer by using a photosensitive layer contg. a specific photosensitive polyester resin. CONSTITUTION:The photosensitive layer comprises the photosensitive polyester resin or the modified polyester resin having a photosensitive unsatd. double bond adjacent to an arom. ring as a main molecular chain, and a photosensitive unsatd. double bond and a carboxyl group as a pendant group. The polyester resin is constituted of >=0.4mol photosensitive unsatd. double bond and the carboxyl group having >=15 acid value per 1,000g polyester resin. The photosensitive unsatd. double bond adjacent to the arom. ring is derived from a dicarboxylic acid shown by the formula I (wherein R1 is a hydrogen atom, a C1-4 alkyl group). The photosensitive unsatd. double bond which is the pendant of the polyester resin is derived from an epoxy resin shown by the formula II (wherein R1 is the same as mentioned above; R3 is a hydrogen atom, methyl, phenyl group). The image forming material has the high photosensitivity and eanble to develop from the aqueous alkaline developer and is suitable for a photosensitive planographic plate and also is useful for a photoresist. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6470744-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010077283-A |
| priorityDate | 1984-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.