http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S59169140-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44f82521bd7b49adba4be2e3e4f3b66a
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 1983-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08517e8cd2dc0b0466ad4d1f2cbd1457
publicationDate 1984-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S59169140-A
titleOfInvention Manufacture of semiconductor device
abstract PURPOSE:To obtain a method of forming a surface protecting film for gaining a stable element having high reliability by vapor phase etching the surface of a substrate before forming a surface protecting film. CONSTITUTION:After a GaAs crystal surface 8 is plasma etched in a mixture gas plasma atmosphere of AsCl3+H2 or AsH3+Cl2 to remove oxide and ultrafine dusts of a surface layer in a reaction chamber used to form by a plasma CVD method the vapor phase growth of a silicon oxidized film 7, it is switched to a mixture gas plasma of a known SiH4+O2 to vapor phase grow the film 7 on the surface 8. When the plasma etching is advanced by chlorine gas plasma, arsenic compound (AsCl3 or AsH3) gas is contained. Accordingly, As which is readily sublimated like GaAs is particularly isolated from the surface to suppress the production of arsenic cavity. Thereafter, the steps similar to the conventional method are employed.
priorityDate 1983-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24570
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556973
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419586572
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520585
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419548998
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24526
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359596
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23969
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123

Total number of triples: 27.