http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5914639-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44f82521bd7b49adba4be2e3e4f3b66a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate | 1982-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_022500bac1fbcdf9b4dc5e26dd23094d |
| publicationDate | 1984-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S5914639-A |
| titleOfInvention | Manufacture of semiconductor device |
| abstract | PURPOSE:To prevent the resolution of an alumium surface from decreasing due to multiple reflection without fail at the time of etching aluminum by bonding resin containing colorant which absorbs the prescribed wavelength on the surface of an aluminum layer. CONSTITUTION:An electron beam resist 14, to which dye for mainly absorbing ultraviolet ray is added, is rotatably coated on a thin aluminum layer 12, heated, and formed. A positive type resist mask 13'' is coated, and a reflection preventive layer 14 and the layer 12 are etched by a parallel flat plate type plasma device with CCl4 gas. Since polymethyl methacrylate used on the layer 14 is etched remarkably faster than the aluminum, it does not affect adversely the workability of etching the aluminum layer 12. According to this structure, multiple reflection at the time of exposure can be prevented by the layer 14, thereby obtaining significant resolution as compared with conventional one to ultrafinely form the pattern, and since parallel flat type plasma etching is used, the aluminum is vertically etched so that the pattern is not damaged. |
| priorityDate | 1982-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.