http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5774370-A

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filingDate 1981-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70273858bb67835582f63e7a1f6c4819
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publicationDate 1982-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S5774370-A
titleOfInvention High-purity silica-forming coating solution
abstract PURPOSE: To provide the titled coating soln. having excellent corrosionproofness and suitable as a raw material for the production of an insulating film for electronic parts, by treating a reaction product between a halogenosilane or an alkoxysilane and a carboxylic acid or water with ion exchange resins. n CONSTITUTION: One mol of a halogenosilane of formulaI(wherein X is halogen; R is alkyl or aryl; n is 0W3) such as trimethyltrichlorosilane or an alkoxysilane of formula II (wherein X is halogen; R' is alkyl, aryl or glycidoxyalkyl; n is 0W4) such as dimethoxydichlorosilane, is reacted with 2W8mol of a carboxylic acid such as acetic acid or water in the presence of a catalyst such as hydrochloric acid and in an org. solvent. The reaction product is treated with a basic anion exchange resin, and then with a strongly acidic cation exchange resin to produce the desired coating soln. n COPYRIGHT: (C)1982,JPO&Japio
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priorityDate 1981-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 32.