http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5713743-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f4ff9ddf728a7e1a0b36c9cc38b89ad6
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-185
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-18
filingDate 1980-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e3a0cc812820818d04b494dccbeb4b9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f14d25cbf7d9da9d9f7e1799d2da4ee6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_271c59fdc422511eae42ecf5d610fc93
publicationDate 1982-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S5713743-A
titleOfInvention Plasma etching apparatus and etching method
abstract PURPOSE:To prevent an element to be etched from being corroded by providing means for connecting or separating a main etching chamber, a post-treatment chamber and a cassette chamber via partition valves in vacuum state. CONSTITUTION:An element to be etched, e.g., aluminum is conveyed by the operations of valves 9, 10 from a cassette chamber 2 to which the aluminum is conveyed to a main etching chamber 2 having parallel planar electrodes opposed to one another and means for applying high frequency electric power, the chamber is evacuated in vacuum, e.g., 10<-5> Torr or lower, a mixture gas of carbon tetrachloride and chlorine gas is introduced into the chamber, an electric discharge is taken place, and the aluminum is thus etched. Thereafter, a valve 14 is opened, the aluminum is moved to a post-treatment chamber 3, is treated with plasma of inert gas, is then conveyed to a cassette chamber 16, and is exhausted. Thus, the chlorine gas is not retained in the chamber, and the aluminum is not corroded.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0415919-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H04107281-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07326606-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6454731-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6074436-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07326607-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0522379-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0316126-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S60115231-A
priorityDate 1980-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S56278-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556973
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527288
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5943
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24526

Total number of triples: 41.