http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1199479-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1374dd16777534b65ad4422333245af8
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D04H1-542
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-20
filingDate 1997-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d8fe3df3e61defb57ae5d7437733fdd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25722fea386ec9f0bd7797ecb52d45c3
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publicationDate 1999-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H1199479-A
titleOfInvention Polishing pad
abstract (57) Abstract: An object of the present invention is to provide a polishing pad for precision polishing such as for a semiconductor wafer, a liquid crystal glass, and a hard disk, particularly a polishing pad for CMP, which has sufficient hardness and wet strength, and Another object of the present invention is to provide a polishing pad excellent in dressing property. SOLUTION: In a polishing pad made of a nonwoven fabric impregnated with a high-molecular elastic polymer, the polishing pad surface has a hardness of 8%. A polishing pad characterized by being at least 5 ° and at most 99 °.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008093850-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008530391-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006035322-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220117220-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002009025-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210106436-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-02100595-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007069046-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012081583-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010016486-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8647179-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014125797-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150116876-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014123777-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006043811-A
priorityDate 1997-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 39.