http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1161415-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5547f741b25666fc4ae5195cf71a979b |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-511 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate | 1997-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7993022eba7015e3bf01f272cb73fdbd |
| publicationDate | 1999-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H1161415-A |
| titleOfInvention | Film forming method and apparatus by plasma CVD with etching reaction |
| abstract | (57) [Problem] To use a material system in which a film deposition reaction and a film etching reaction can simultaneously occur in a plasma in which a complicated chemical reaction occurs, and to pay attention to a film formation type and an etching type. Accordingly, it is possible to provide a method for easily finding an optimum film forming condition and producing a film having good characteristics with good reproducibility. SOLUTION: The luminous intensity of a film-forming species and an etching species under optimal film-forming conditions is preset as an optimal luminous intensity, and the luminous intensity of the film-forming species and the etching species contained in the plasma during film formation is determined. The film formation is monitored and the film forming conditions are controlled so that the optimum light emission intensity is maintained. |
| priorityDate | 1997-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.