| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1998-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bdd0386368eaa2489f7fec1f162e0605 |
| publicationDate |
1999-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H11352692-A |
| titleOfInvention |
Resist composition |
| abstract |
(57) [Problem] To provide a resist composition suitable for electron beam drawing. SOLUTION: When a polymer in which an acid labile group is bonded to a copolymer of a hydroxystyrene-based compound and acrylonitrile or a derivative thereof is used, when a resist composition having excellent resist properties is used, not only exposure to far ultraviolet rays but also It is possible to stably realize excellent resolution for line drawing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002214788-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004339522-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100520163-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004021450-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-100435355-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4586318-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7419894-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7220628-B2 |
| priorityDate |
1998-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |