http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11352676-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 1999-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c855660727dfc3eb722ad8fe3f93b71 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_931bd210e56989f760258b3cd98516d4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11831bd41ce6110ea0adcd055e62ca0b |
| publicationDate | 1999-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11352676-A |
| titleOfInvention | Positive radiation-sensitive resist composition and method for producing resist pattern using the same |
| abstract | [Problem] To provide a high-sensitivity positive-type radiation-sensitive resist composition capable of forming a high-definition pattern in a positive-type radiation-sensitive resist composition containing a novolak resin and a quinonediazide photosensitizer as main components. . A positive radiation-sensitive resist composition comprising at least one kind of a novolak resin, a quinonediazide compound, and a compound represented by the general formula (1) as main components, and production of a resist pattern using the same. Law. Embedded image (R 1 and R 2 are a hydrogen atom, a straight chain having 1 to 15 carbon atoms, Represents any of a branched or cyclic alkyl group, an aryl group, and an aralkyl group, wherein R 3 is a hydrogen atom, having 1 to 1 carbon atoms. It represents any of up to 5 linear or branched alkyl, aryl, aralkyl, and amino groups. R 1 and R 2 , or those in which R 1 and R 3 are closed are included. ) |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019003913-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110914756-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4581387-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019003913-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100710604-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004272212-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015014705-A |
| priorityDate | 1998-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 231.