http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015014705-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 |
| filingDate | 2013-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a57b0cc94cb5b78fd17a1d3154c5bf6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4d090e622535a3194c657ff8456c66e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9fdcc1e651c62e5856b1347e39dc8f16 |
| publicationDate | 2015-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015014705-A |
| titleOfInvention | Negative photosensitive resin composition |
| abstract | A negative-type photosensitive resin composition containing polyamic acid that can form a good pattern by photolithography and gives a polyimide resin having excellent heat resistance, and a patterned polyimide resin film using this composition The manufacturing method of this, the flexible film provided with the said polyimide resin film obtained by this manufacturing method, and a flexible substrate provided with this film are provided. A negative photosensitive resin composition according to the present invention comprises (A) a polyamic acid having a mass average molecular weight of 4000 to 60000 and a dispersity of 3.5 or less, and (B) generating an acid or a base by the action of light. And (C) N, N, N ′, N′-tetramethylurea. The manufacturing method of the patterned polyimide resin film based on this invention is the coating-film formation process which forms the coating film which consists of the said composition, the exposure process which selectively exposes the said coating film, and the said after exposure A development step for developing the coating film and a heating step for heating the coating film after development are included. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113912846-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113912846-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016011418-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022138674-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022137294-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015186782-A1 |
| priorityDate | 2013-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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