http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11333287-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1010e3862914acdd087e73d76911ec6d http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_94b8a616160d18d90a44bac084da143b |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G5-00 |
| filingDate | 1998-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59fc0c1700bb5937ff293fad65c5c318 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65629ffab7a92c216bbef41ee176552d |
| publicationDate | 1999-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11333287-A |
| titleOfInvention | Flat plate type plasma processing equipment |
| abstract | (57) [Summary] [PROBLEMS] To ensure that the surface of an object to be treated is assured and efficient, and that the entire surface is homogeneous without utilizing ions or electrons to damage, and to effectively utilize chemically active neutral excited species. In order to be able to process such as reforming. SOLUTION: A flat plate-shaped high-voltage electrode 1 and a ground electrode 6 using punched metal are arranged to face each other with an insulator 5 interposed therebetween to form a discharge portion 4 formed by a minute gap between the electrodes 1 and 6. By supplying the mixed reaction gas to the portion 4 from a plurality of locations around the electrodes 1 and 6 through the slit-shaped gas supply holes 18A and 18B in a counter-current state, the mixed reaction gas is supplied to both electrodes 1 and 6. Is excited and decomposed by a glow discharge plasma generated by the application of a high-frequency voltage to generate a gas flow containing a chemically active neutral excited species. Are configured to irradiate the surface of the object to be treated, which is disposed to face the outside of the discharge unit 4, through the gas flow ejection holes 3. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014170900-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101368669-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004006211-A |
| priorityDate | 1998-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.