http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11330057-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| filingDate | 1998-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4501287df6cb98c4a0bbe528bfcdc764 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2598ecd67fcb292b600df7f0696ddf1c |
| publicationDate | 1999-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11330057-A |
| titleOfInvention | Oxide film etching method |
| abstract | (57) [Summary] [PROBLEMS] In a case where wiring exists at a deep position and a shallow position, an oxide film can be etched to a wiring at a deep position and an oxide film next to the wiring at a shallow position is etched. Provided is a method for etching an oxide film, which can prevent the occurrence of an oxide film. SOLUTION: A processing gas containing a C 4 F 8 gas or a C 5 F 8 gas is introduced into a processing chamber, a plasma of the processing gas is generated, and holes are formed in an oxide film formed on the substrate by etching. In this case, the flow rate of C 4 F 8 gas or C 5 F 8 gas is set to 1 to 4 SCCM, or C 4 F 8 gas or C 5 F The partial pressure of F 8 gas and 0.07～0.35MTorr. Further, a processing gas containing CO gas is further introduced, and the ratio of CO gas to C 4 F 8 gas or C 5 F 8 gas is set in the range of 35 to 200. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100536359-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002100607-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6897153-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006196663-A |
| priorityDate | 1998-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425193155 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID783 |
Total number of triples: 22.