http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11258782-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L35-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1998-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 |
| publicationDate | 1999-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11258782-A |
| titleOfInvention | Positive photosensitive composition |
| abstract | PROBLEM TO BE SOLVED: To be suitable for use of an exposure light source of 250 nm or less, particularly 220 nm or less, specifically, when using an exposure light source of 250 nm or less, especially 220 nm or less, a significantly improved good sensitivity and excellent sensitivity. An object of the present invention is to provide an excellent positive photosensitive composition which can form a resist pattern having good developability, that is, no development defects, and good adhesion between a pattern and a substrate. SOLUTION: The compound which generates an acid upon irradiation with an actinic ray or radiation and at least one specific monovalent polycyclic alicyclic group is decomposed by the action of an acid to form an alkali developing solution. A positive photosensitive composition containing a resin having a group that increases solubility and a compound having a specific hydrophilic group. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007256787-A |
| priorityDate | 1998-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 738.