| abstract |
PROBLEM TO BE SOLVED: To provide a positive photoresist composition capable of forming a resist pattern having excellent adhesion to a substrate, particularly a thin film of a metal oxide, a metal sulfide or the like on a glass by vapor deposition or sputtering. Provided is a positive photoresist composition capable of forming a resist pattern having excellent adhesion to a formed substrate. SOLUTION: A photosensitive composition comprising a quinonediazide group-containing compound has at least one nitrogen-containing heteroatom selected from an 8-oxyquinoline derivative, a 4-hydroxypteridine derivative, a 1,10-phenanthroline derivative, and a 2,2'-bipyridyl derivative. A positive photoresist composition comprising a ring compound. |