| abstract |
(57) Abstract: Provided is a method for forming a thick film pattern which can reduce the defects of a barrier layer, an electrode, and a dielectric layer and can be formed flat in the manufacture of a plasma display panel. SOLUTION: By applying or printing a thick film pattern forming material containing at least an inorganic component having a glass frit and a binder resin on a substrate over the entire surface or in a pattern, a flattening process is performed to reduce defects. A flat thick film pattern can be formed. The flattening treatment can be performed by pressing a barrier layer, an electrode, and a dielectric layer with or without a peelable film using a press roll or a platen. |