| abstract |
PROBLEM TO BE SOLVED: To provide a positive or negative radiation-sensitive resin composition useful as a chemically amplified resist having a small edge roughness, high sensitivity and high resolution in a fine pattern of 0.2 μm or less. I will provide a. SOLUTION: The positive radiation-sensitive resin composition comprises (A) Contains a fullerene derivative soluble in a solvent for resist, (B) a radiation-sensitive acid generator, and (C) (a) a resin containing an acid dissociable group, or (b) an alkali-soluble resin and an alkali-solubility controller. , A negative-type radiation-sensitive resin composition, It contains a compound capable of crosslinking the alkali-soluble resin in the presence of the component (A), the component (B), the alkali-soluble resin (D), and the acid (E). |