http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008513820-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-76 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2005-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008513820-A |
| titleOfInvention | Use of methanofullerene derivatives as resist materials and methods for forming resist layers |
| abstract | In one aspect, the present invention relates to the use of a methanofullerene derivative having a plurality of unlimited adducts as a resist material, and a method for forming a patterned resist layer on a substrate using the methanofullerene derivative. The methanofullerene derivative is represented by the formula C 2x (CR 1 R 2 ) m , wherein X is at least 10, m is at least 2, and each adduct represented by CR 1 R 2 is The same or different, wherein each R 1 and R 2 is a monovalent organic group or a divalent organic group that is bonded to the fullerene shell to form a ring structure, or at least two of R 1 , Or, except that at least two of R 2 are monovalent, both of R 1 and R 2 of the adduct are divalent groups, and they may be bonded to each other to form a ring structure, or A mixture of such derivatives. The invention also belongs to the use of a methanofullerene derivative that is chemically amplified in the formation of a patterned resist layer. An essential step of the present invention is to form a coating layer comprising a methanofullerene derivative on the substrate surface, but at least increase the sensitivity of the exposed layer to actinic radiation used to pattern the layer later. The methanofullerene derivative is chemically amplified by including one additional component in the coating layer. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8956802-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015535526-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011108365-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013511502-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5757286-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160023923-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015513786-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016517532-A |
| priorityDate | 2004-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 99.