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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_325e8f74339359cd24e45eb790ace68f
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
filingDate 1996-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a661f757557797656c8ebe635117281
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b47279ee25c03bc7fe11c1d59471401
publicationDate 1998-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H1098036-A
titleOfInvention Method for forming siliceous pattern
abstract (57) [Problem] To provide a simple method for forming a siliceous pattern. SOLUTION: (A) a step of applying a specific polysilazane or a modified product thereof to a substrate; and (B) a step of coating a predetermined region of the surface of the polysilazane coating film obtained in the step (A) with a hydrophobic material. (C) a step of contacting an amine compound and water with a polysilazane coating film not coated with the hydrophobic material to convert at least a part of the polysilazane to silica; and (D) a step of converting the hydrophobic material and polysilazane under the hydrophobic material. Dissolving and removing the coating film; and, if necessary, (E) A method for forming a siliceous pattern, comprising a step of further oxidizing the coating film containing silica.
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priorityDate 1996-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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