http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1091084-A

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filingDate 1996-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc7d56109fb01d655c519a0b91102d33
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publicationDate 1998-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H1091084-A
titleOfInvention Patterning method of transparent conductive film and substrate with transparent electrode
abstract [PROBLEMS] To provide a patterning method capable of forming a fine electrode pattern of a low specific resistance transparent conductive film with high accuracy and high yield, and to provide a substrate with a transparent electrode formed by the method. An acid-soluble transparent oxide layer (2, 4) on a substrate (1) is provided. The transparent conductive film formed by laminating the metal layer 3 and the metal layer 3 is etched using an acidic aqueous solution containing halogen ions, and then immersed in an aqueous solution of an alkali metal halide salt.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008066748-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006229196-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006163367-A
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