http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004172427-A

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filingDate 2002-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7c5274f801c407bf0d19dd02db72423
publicationDate 2004-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2004172427-A
titleOfInvention Etching solution and etching method
abstract An etching solution and an etching method for a silver-containing film capable of suppressing side etching and performing pattern processing with high reproducibility and high accuracy are provided. An etching solution for etching a silver-containing film, wherein the etching solution is an aqueous solution containing oxidizing ions and halogen ions, and a resist pattern is used as a mask. An etching method for forming a pattern of a silver-containing film 13 formed on an insulating film 12, wherein the silver-containing film 13 is etched using an aqueous solution containing oxidizing ions and halogen ions as an etching solution 21. An etching method characterized by the following. [Selection diagram] Fig. 1
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