| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5547f741b25666fc4ae5195cf71a979b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7833 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32135
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28518
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-665 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 |
| filingDate |
1997-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37132fdea4b6f63be412fc7ce0ae0c1e |
| publicationDate |
1998-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H10308360-A |
| titleOfInvention |
Method for manufacturing semiconductor device |
| abstract |
[PROBLEMS] To prevent an unnecessary metal film while leaving a metal silicide film in order to prevent cracking or peeling of a metal nitride film by a CVD method having a film thickness required for a contact hole or a through hole. Although it is necessary to remove it, there are problems such as many steps in the removal. A metal film is formed by a chemical vapor deposition method at a semiconductor substrate temperature of 500 ° C. or higher, and then unnecessary metal films other than the metal silicide film are selectively removed with an etching gas containing halogen. . |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10903086-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007150362-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001210713-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7547607-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180119113-A |
| priorityDate |
1997-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |