| abstract |
(57) [Summary] (Problem corrected) [PROBLEMS] To provide a photosensitive film and a method for manufacturing a pattern, which can easily and inexpensively produce a high-precision metal black matrix pattern with few steps. (B) A photosensitive film for producing a black matrix pattern containing a metal as a main component and a thin film containing a metal as a main component comprising a photosensitive resin layer having a thickness of 0.5 to 18 μm are formed. A photosensitive resin layer having a thickness of 0.5 to 18 μm, which is laminated on the substrate, is exposed in a pattern, and is selectively removed by development to form a resist pattern. A method of manufacturing a black matrix pattern in which a portion of a thin film mainly composed of a metal not covered by a resist pattern is removed by etching, and then the resist pattern is removed to form a thin film pattern mainly composed of a metal. |